Uploaded January 2022 | Updated September 2026, 1 week ago
The mechanism for the addition of a Teoc protection group using Teoc-OSu and a base such as triethyl amine. This group can be subsequently deprotected using TBAF due to the silyl group in the Teoc group.
Music: Clean Memories – Mokka
The mechanism for the addition of a Teoc protection group using Teoc-OSu and a base such as triethyl amine. This group can be subsequently deprotected using TBAF due to the silyl group in the Teoc group.
Music: Clean Memories – Mokka










