Uploaded August 2025 | Updated September 2026, 2 weeks ago
How does a High NA system create extreme ultraviolet (EUV) light?
In this video, Greet Storms, head of product management for High NA EUV at ASML, explains how EUV light is generated and used for imaging in advanced chipmaking.
From flattening a 30-micron droplet of tin into a pancake to creating a plasma 40 times hotter than the surface of the sun, the system produces light with a peak wavelength of 13.5 nanometers. This all happens 50,000 times per second to generate the EUV light used in High NA lithography.
Step inside one of the most cutting-edge semiconductor manufacturing machines in the world and witness how it all starts.
Watch more about High NA EUV lithography on our playlist: youtube.com/playlist?list=PLLROOWd6snSJYLbsPi976CONmyL0CDe8y
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Or visit our website: asml.com
How does a High NA system create extreme ultraviolet (EUV) light?
In this video, Greet Storms, head of product management for High NA EUV at ASML, explains how EUV light is generated and used for imaging in advanced chipmaking.
From flattening a 30-micron droplet of tin into a pancake to creating a plasma 40 times hotter than the surface of the sun, the system produces light with a peak wavelength of 13.5 nanometers. This all happens 50,000 times per second to generate the EUV light used in High NA lithography.
Step inside one of the most cutting-edge semiconductor manufacturing machines in the world and witness how it all starts.
Watch more about High NA EUV lithography on our playlist: youtube.com/playlist?list=PLLROOWd6snSJYLbsPi976CONmyL0CDe8y
Dive into our nano world and follow us on social media:
Facebook: facebook.com/asml
Instagram: instagram.com/lifeatasml
X: twitter.com/ASMLcompany
LinkedIn: linkedin.com/company/asml
Or visit our website: asml.com
