@mitocw
  @mitocw
MIT OpenCourseWare | 5. Wafer Cleaning and Gettering - Contamination Measurement Techniques @mitocw | Uploaded June 2024 | Updated October 2024, 10 hours ago.
MIT 6.774 Physics of Microfabrication: Front End Processing, Fall 2004
Instructor: Judy Hoyt

View the complete course: https://ocw.mit.edu/courses/6-774-physics-of-microfabrication-front-end-processing-fall-2004/
YouTube Playlist: youtube.com/playlist?list=PLUl4u3cNGP61IMhYaHL_x-RzNUIDJD9XK

License: Creative Commons BY-NC-SA
More information at https://ocw.mit.edu/terms
More courses at https://ocw.mit.edu
Support OCW at ow.ly/a1If50zVRlQ

We encourage constructive comments and discussion on OCW’s YouTube and other social media channels. Personal attacks, hate speech, trolling, and inappropriate comments are not allowed and may be removed. More details at https://ocw.mit.edu/comments.
5. Wafer Cleaning and Gettering - Contamination Measurement TechniquesLecture 1: Introduction to 14.02 Principles of Macroeconomics8. Dopant Diffusion - Need for Abrupt Profiles, Ficks Laws, Simple AnalyticLecture 16: Convergence and Cross-Country VariationLecture 24: Control, Part 1Lecture 7: Photovoltaic cellsLecture 19: Nuclear Diagnostics (old)Introducing the Open Learners PodcastLesson 9 Part 2Lecture 32: Switched-Capacitor Convertors, Part 2Lecture 04: Price Discrimination, Part 2Climate Science, Risk and Solutions: The MIT Climate Primer

5. Wafer Cleaning and Gettering - Contamination Measurement Techniques @mitocw

SHARE TO X SHARE TO REDDIT SHARE TO FACEBOOK WALLPAPER